IEEE is the world’s largest technical professional organization dedicated to advancing technology for the benefit of humanity. IEEE and its members inspire a global community through its highly cited publications, conferences, technology standards, and professional and educational activities.

IEEE Estonia Section is locally supporting IEEE activities mostly through the organization of professional meetings, invited lectures, workshops and other events.

Upcoming Events

No upcoming events


Baltic Cooperation Conference, Riga, 29-30.09.2007

The objective of this conference is to create a functioning cooperation between the Baltic Region sections which shall result in common activities, such as; joint events, joint chapters and common utilization of IEEE resources.


Sweden, Finland, Estonia, Lithuania, Russia North-West, Poland, Germany, Norway, Denmark, Iceland

Web site: http://www.ieee.se/baltic/

NORCHIP 2007, Aalborg, DK, 19-20.11.2007

The NORCHIP conference is the main microelectronics event of the Nordic countries. The annual IEEE CAS sponsored conference covers all areas of microelectronics, spanning from large digital systems to simple analog circuits. The wide scope of NORCHIP is intentional promoting cross-field collaboration. NORCHIP is a well established conference with representation from both academia and industry. Papers of the highest scientific and technical quality are presented together with selected invited speakers and pre-conference tutorial sessions.

Design for Manufacturability: Sandip Kundu 3.10.2007

C/COM Chair Gert Jervan is happy to invite you to the talk by Distinguished Visitor of IEEE Computer Society Sandip Kundu. Sandip was with IBM (1988-1997), Intel (1997-2005) and is currently Professor of Electrical and Computer Engineering at the University of Massachusetts, Amherst. He is a fellow of IEEE (detailed bio is below).

Date: October 3, 2007
Time: 12:00
Place: IT-140 (TTÜ, Raja 15)

Design for Manufacturability 
Design for Manufacturability (DFM) is a design approach that
simultaneously considers all of the design goals such as
functionality, area, power and performance as well as constraints such
as optical patterning limitations including diffraction and etches.
Manufacturing yield can be improved through design process.
Incorporating design practices to improve manufacturing yield has
gained recent attention. In this talk, we will explore
photolithography trends and how they restrict designs and describe the
process of yield improvement through better physical design as well as
yield recovery through test oriented learning process.

Presenter Biography
Sandip Kundu is Professor of Electrical and Computer
Engineering at the University of Massachusetts, Amherst. Previously he
was at Intel Corporation (till January 2005). Prior to joining Intel,
he was a member of the research staff at the IBM T. J. Watson Research
Laboratory (1988-1997). He has published over 85 papers, holds 12
patents and has given 13 tutorials in forums such as ICCAD, EDAC,
DATE, ASP-DAC, ATS, ETW and ITC. Sandip has also been in numerous
program committees including DAC, ICCAD, DATE and ICCD. He was the
technical program chair for ICCD 2000, general chair in 2001. He was
the general chair of VLSI conference in India in 2005. He is currently
a Distinguished Visitor of IEEE Computer Society, fellow of IEEE and
an Associate Editor of IEEE Transactions on VLSI. Previously, he was
an associate editor of IEEE Transactions on Computers.
His visit is partially supported by the IEEE CS Distinguished Visitors
program and partially by the Estonian Graduate School in ICT.